Publications

@article{2006yatsuiAPBimprint,

title = {High-resolution capability of optical near-field imprint lithography},

author = {Takashi Yatsui and Yuuki Nakajima and Wataru Nomura and Motoichi Ohtsu},

doi = {10.1007/s00340-006-2328-5},

year  = {2006},

date = {2006-07-01},

journal = {Applied Physics B},

volume = {84},

number = {1-2},

pages = {265-267},

publisher = {Springer Nature},

abstract = {We propose a novel method to increase the resolution of imprint lithography by introducing strong localization of the optical near-field intensity, depending on the mold structure. By optimizing the thickness of the metallic film on a SiO2 line-and-space (LS) mold without a sidewall coating, we confirmed that the optical near-field strongly localizes at the edge of the mold, using a finite-difference time-domain calculation method. Based on the calculated results, we performed optical near-field imprint lithography using a mold with metallized (20-nm-thick Al without a sidewall coating) SiO2 LS with a 300-nm half-pitch that was 200-nm deep with illumination using the g-line (wavelength of 436 nm), and obtained features as narrow as 50 nm wide.},

keywords = {First, Imprint, Nanophotonic fabrication, Near-field effect},

pubstate = {published},

tppubtype = {article}

}