Surface improvement of organic photo-resists through a near-field-dependent etching method
Our paper was published in Beilstein Journal of Nanotechnology
F. J. Brandenburg, T. Okamoto, H. Saito, O. Soppera, and T. Yatsui, “Surface improvement of organic photo-resists through a near-field-dependent etching method,” Beilstein Journal of Nanotechnology, April 2017, Vol. 8, pp.784–788.
[Significance of this article]
This study explores the wavelength dependence of near-field etching on organic photo-resists. We believe that our study makes a significant contribution to the literature due to the importance of near-field etching in developing future high-performing semi-conductors. Further, this work provides some of the first insights of the nano-scale flattening near-field etching applied on organic photo-resists.