Magnetic field affecting electrons

Our paper was published in Light: Science & Applications

T. Yatsui, T. Tsuboi, M. Yamaguchi, K. Nobusada, S. Tojo, F. Stehlin, O. Soppera, D. Bloch, “Optically controlled magnetic-field etching on the nano-scale,” Light: Science & Applications, Volume 5, March 2016; e16054; doi: 10.1038/lsa.2016.54

[Significance of this article]

The study of electric fields in nano-scale materials has facilitated tuning of the magnetic permeability in these substances. However, while the effects of the electric field on the chemical and physical reactions in these substances are known, the interaction of the magnetic field is less well understood. This study examines nano-scale etching of ZrO2 nano-stripe structures and identifies polarization-dependent behavior. This phenomenon is examined using a finite-difference time-domain (FDTD) method and it is found that the etching properties are determined by the magnetic rather than the electric field. The findings of this study have implication for the preparation of nano-scale materials via optically controlled magnetic-field etching. Furthermore, the optically controlled magnetic-field interaction with material excitation on the nano-scale will allow new spin manipulation in space and time to be realized, in the absence of an external magnetic field.


Nobusada Group, Institute for Molecular Science

Tojo Laboratory, Chuo University

Institut de Sciences des Materiaux de Mulhouse (IS2M)

Laboratoire de Physique des Lasers, Université Paris 13